US20060198950A1 - Method of manufacturing patterned recording medium - Google Patents
Method of manufacturing patterned recording medium Download PDFInfo
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- US20060198950A1 US20060198950A1 US11/367,452 US36745206A US2006198950A1 US 20060198950 A1 US20060198950 A1 US 20060198950A1 US 36745206 A US36745206 A US 36745206A US 2006198950 A1 US2006198950 A1 US 2006198950A1
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- Prior art keywords
- thin film
- hard mask
- magnetic thin
- laser
- recording medium
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
Definitions
- the present invention relates to a method of manufacturing a data recording medium, and more particularly, to a method of manufacturing a patterned recording medium.
- Hard disks are universally used as recording media internally or externally installed in computers. Hard disks are also used as portable data recording units. Data are recorded in units of bits on a magnetic thin film in a hard disk. When a bit data, for example ‘ 1 ’, is recorded on a region of the magnetic thin film, a magnetic dipole in the region is aligned in a predetermined direction. To increase the data recording density of a hard disk, the area of the region where the bit data is recorded in the magnetic thin film should be decreased while maintaining the reliability of the bit data recorded on the magnetic thin film. To satisfy this demand, interactions between the regions of the magnetic thin film storing the bit data and the influence of reading or recording bit data from or to a given region upon other recorded regions of the magnetic thin film should be minimized.
- a recording medium having a patterned magnetic thin film in which data recording regions are separated from each other (hereinafter, referred to as a patterned recording medium) has been recently introduced.
- the patterned recording medium has a high recording density and is manufactured using a photolithography method, a nano-imprinting method, a self-ordered magnetic array (SOMA) method, or a laser patterning method.
- SOMA self-ordered magnetic array
- the uses of such methods have limitations for mass production, reducing the size of data recording regions, and obtaining desired throughput.
- the laser patterning method is advantageous in that a patterning process used is simple and surfaces of obtained patterns are usually continuous, but is disadvantageous in that it is difficult to reduce the pattern size to less than 100 nm and to decrease the pitch of the pattern suitably for a high-density recording medium.
- three incident beams are required to obtain a circular pattern such that an apparatus used for the laser patterning method may be larger and complicated.
- the present invention provides a method of manufacturing a recording medium that allows the reduction of sizes and pitches of regions (hereinafter, patterns) where bit data is recorded in a magnetic film and is simple.
- a method of manufacturing a patterned recording medium including: depositing a magnetic thin film on a substrate; aligning a hard mask that has a plurality of penetration holes regularly distributed therein above the magnetic thin film; irradiating the hard mask; and removing the hard mask.
- the diameters of the penetration holes may be less than 100 nm.
- the pitches of the penetration holes may be of a nanometer scale.
- the magnetic anisotropic energy of the magnetic thin film may be in the range of 5 ⁇ 10 4 to 5 ⁇ 10 8 erg/cc.
- Light irradiated onto the hard mask may be a laser beam having a wavelength greater than the diameters of the penetration holes.
- the laser beam may be emitted, using a CO 2 laser, an Nd:YAG laser, a He—Ne laser, a N 2 laser, a HF laser, or a DF laser.
- Lenses may be formed in at least one of outlets and inlets of the penetration holes.
- the hard mask may contact the magnetic thin film.
- the hard mask may be formed using anodic aluminum oxidization (AAO).
- AAO anodic aluminum oxidization
- the present invention can simultaneously form patterns on a magnetic thin film of a recording medium in a single process. Accordingly, since the process of forming patterns is simple, the production of the recording media can be increased. In addition, since the sizes and pitches of the patterns formed in the magnetic thin film are determined according to the sizes and pitches of holes formed on a hard mask, the sizes of the patterns can be reduced to less than 100 nm and the pitches of the patterns can be also decreased. In particular, since the patterns are simultaneously formed using the hard mask, the patterns can be regularly formed, thereby increasing the density of the patterns, and increasing the recording density of the recording medium.
- FIG. 1 is a cross-sectional view of a preliminary recording medium and a hard mask for a method of manufacturing a patterned recording medium according to an embodiment of the present invention
- FIG. 2 is a plane view of the hard mask illustrated in FIG. 1 ;
- FIG. 3 is a cross-sectional view illustrating the incidence of laser beams on the recording medium of FIG. 1 ;
- FIG. 5 is a cross-sectional view of a preliminary recording medium and a hard mask for a method of manufacturing a patterned recording medium according to another embodiment of the present invention
- FIG. 6 is a plan view illustrating when directions of magnetic dipoles in patterns formed on the magnetic thin film of the recording medium of FIG. 3 are normal to the surface of the magnetic thin film;
- FIG. 7 is a cross-sectional view of the recording medium sectioned along the line 7 - 7 ′ of FIG. 6 ;
- FIGS. 8 through 10 are cross-sectional views of hard masks having lenses.
- a method of manufacturing a patterned recording medium according to an embodiment of the present invention employs a laser patterning technology and a specific hard mask to manufacture a recording medium having desired patterns.
- the laser patterning technology is used for changing magnetic characteristics of a predetermined region of a magnetic thin film, for example, changing the region from a paramagnetic region to a ferromagnetic region. That is, a predetermined paramagnetic region is instantly heated up to a high temperature, for example, 500 to 2,000° C., using the laser, and becomes ferromagnetic. The ferromagnetic region on the magnetic thin film becomes a pattern where bit data is recorded.
- a magnetic thin film 32 is deposited on a substrate 30 to form a preliminary recording medium 35 .
- the magnetic thin film 32 may be a paramagnetic thin film and have a magnetic anisotropic energy of 5 ⁇ 10 4 to 5 ⁇ 10 8 erg/cc.
- a hard mask 36 is aligned above the preliminary recording medium 35 .
- the hard mask 36 is formed of, for example, an aluminum oxide layer, and has a thickness of 5 to 100 nm.
- the hard mask 36 has a plurality of penetration holes h regularly distributed therein, as illustrated in FIG. 2 .
- FIG. 1 illustrates a cross-section of the hard mask 36 sectioned along the line 1 - 1 ′ in FIG. 2 .
- the penetration holes h can have various shapes and may be, for example, circular, elliptical or rectangular.
- the diameters D of the penetration holes h determine diameters of patterns formed on the magnetic thin film 32 in the following process, and are small, for example, less than 100 nm.
- the pitches p of the penetration holes h determine the pitches of the patterns formed on the magnetic thin film 32 and may be, for example, 25 nm.
- FIG. 3 is a cross-sectional view illustrating incidence of laser beams on the recording medium of FIG. 1 .
- the entire top surface of the aligned hard mask 36 is simultaneously irradiated with a uniform intensity of laser beams 40 .
- One irradiation may be enough, but an additional irradiation can be performed if necessary.
- the laser beams 40 can be scanned across the hard mask 36 , for example, from left to right. Then, the hard mask 36 is removed.
- the incident laser beams 40 can be produced by a laser emitting a long wavelength laser beam, for example, a CO 2 laser, an Nd:YAG laser, a He—Ne laser, a N 2 laser, a HF laser, or a DF laser.
- the intensity of the laser beams 40 may be sufficient to instantly heat predetermined regions of the magnetic thin film 32 where the laser beams pass through the penetration holes h and, accordingly, make the predetermined regions ferromagnetic.
- the wavelength of the incident laser beams 40 is less than the diameters D of the penetration holes h, most of the laser beams 40 are scattered and few laser beams 40 penetrate the penetration holes h. Otherwise, if the wavelength of the incident laser beams 40 is greater than the diameters D of the penetration holes h, most of the laser beams 40 can reach the magnetic thin film 32 through the penetration holes h, as shown in FIG. 3 . Although not illustrated in FIG. 3 , some of the laser beams 40 can be diffracted through the penetration holes h, causing problems such as a reduction in the sharpness of the patterns. However, adjusting the irradiation conditions of the laser beams 40 and properly changing the distance between the hard mask 36 and the magnetic thin film 32 can overcome such problems.
- the irradiation efficiency of the incident laser beams 40 is higher in the case that the hard mask 36 contacts the magnetic thin film 32 than in the case that the hard mask 36 is separated from the magnetic thin film 32 . Therefore, the electric power used for the incident laser beams 40 can be reduced when the hard mask 36 contacts the magnetic thin film 32 .
- the radiation of the laser beams 40 on the hard mask 36 forms ferromagnetic regions 34 having identical shapes, diameters, and pitches, and a uniform distribution on the magnetic thin film 32 , thus forming a patterned recording medium 100 having the patterns of the ferromagnetic regions 34 .
- a protective layer (not illustrated) can be formed on the magnetic thin film 32 of the patterned recording medium 100 in the following process.
- FIG. 4 is a plan view of the magnetic thin film 32 having the patterns 34 of the patterned recording medium 100 .
- FIG. 3 is a cross-section of the hard mask 36 and the patterned recording medium 100 along the line 3 - 3 ′ in FIG. 4 .
- the patterns in FIG. 4 are exaggerated for clarity.
- the patterns 34 are circular, and are regularly distributed on the magnetic thin film 32 .
- the diameters D 1 of the patterns 34 are less than 100 nm.
- FIG. 4 illustrates magnetic dipoles of the patterns 34 formed on the magnetic thin film 32 in the case of a parallel magnetic recording medium. Arrows in the circles indicate the direction of the magnetic dipoles of the patterns 34 aligned in a certain direction by magnetization.
- FIG. 7 illustrates a cross-section of the pattern 34 sectioned along the line 7 - 7 ′ in FIG. 6 .
- the direction of the magnetic dipoles of FIG. 6 are clearly shown in FIG. 7 .
- the magnetic dipoles 37 of the patterns 34 directed upward with respect to the surface of the magnetic thin film 32 indicates the case of recording bit data ‘0’, when bit data ‘1’ are recorded to some of the patterns using a data recording/reproducing unit including a magnetic head or a probe, the magnetic dipoles 37 of the selected patterns 34 are directed downward.
- lenses 42 can be formed in the hard mask 36 used for forming the patterns 34 on the magnetic thin film 32 .
- the lenses 42 can be formed at outlets or inlets of the penetration holes h formed in the hard mask 36 .
- the magnetic thin film 32 can be separated from the hard mask 36 according to focal lengths and depths of the lenses 42 , and spot sizes of the laser beams 40 can be reduced. Accordingly, the patterns 34 formed on the magnetic thin film 32 can have a higher resolution, thus enhancing the data recording density of the recording medium 100 .
- the incident laser beams 40 are respectively converged by the lenses 42 immediately after penetrating the penetration holes h, thereby eliminating diffraction of the laser beams 40 . Accordingly, the efficiency of using the laser beams 40 is increased.
- first lenses 42 a and second lenses 42 b may be formed at the outlets and inlets of the penetration holes h formed in the hard mask 36 , respectively. Focal lengths of the first and second lenses 42 a and 42 b may be different.
- the magnetic thin film 32 formed on the recording medium 100 may be substituted by other data writable materials, for example, a ferroelectric thin film.
- a material layer may be disposed between the substrate 30 and the magnetic thin film 32 to assist in forming the pattern 34 .
- the hard mask 36 is used to simultaneously form a plurality of patterns. Accordingly, the recording medium can be manufactured in a short time and in large quantities by using the method of the present invention.
- the diameters D and the pitches p of the penetration holes h can be set as desired when manufacturing the hard mask 36 , the penetration holes h can be formed with various shapes.
- the patterns in the patterned recording medium can be circular, the sizes of the patterns can be less than 100 nm, and the pitches of the patterns can be of a nano scale, for example, about 25 nm. Accordingly, the method of manufacturing a patterned recording medium according to the present invention can produce a reliable recording medium having a high data recording density.
Abstract
Provided is a method of manufacturing a patterned recording medium. The method includes depositing a magnetic thin film on a substrate, aligning a hard mask that has a plurality of penetration holes regularly distributed therein above the magnetic thin film, irradiating the hard mask, and removing the hard mask.
Description
- This application claims the benefit of Korean Patent Application No. 10-2005-0018129, filed on Mar. 04, 2005, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein in its entirety by reference.
- 1. Field of the Invention
- The present invention relates to a method of manufacturing a data recording medium, and more particularly, to a method of manufacturing a patterned recording medium.
- 2. Description of the Related Art
- Rapid growth in internet operational technologies and the replacement of conventional metal coaxial cables with optical fibers as data transmission wires enable users to access abundant information in a shorter time.
- Recent development of wireless connection techniques for the internet using portable communication equipment or notebook computers enables users to obtain desired information via the internet from anywhere. As the amount of information accessed via the internet connection and the data transmission rate have increased, high-density recording media, which can rapidly record more information in relatively small areas, and computers or communication equipment using the same have been introduced.
- Hard disks are universally used as recording media internally or externally installed in computers. Hard disks are also used as portable data recording units. Data are recorded in units of bits on a magnetic thin film in a hard disk. When a bit data, for example ‘1’, is recorded on a region of the magnetic thin film, a magnetic dipole in the region is aligned in a predetermined direction. To increase the data recording density of a hard disk, the area of the region where the bit data is recorded in the magnetic thin film should be decreased while maintaining the reliability of the bit data recorded on the magnetic thin film. To satisfy this demand, interactions between the regions of the magnetic thin film storing the bit data and the influence of reading or recording bit data from or to a given region upon other recorded regions of the magnetic thin film should be minimized.
- Accordingly, a recording medium having a patterned magnetic thin film in which data recording regions are separated from each other (hereinafter, referred to as a patterned recording medium) has been recently introduced. The patterned recording medium has a high recording density and is manufactured using a photolithography method, a nano-imprinting method, a self-ordered magnetic array (SOMA) method, or a laser patterning method. However, the uses of such methods have limitations for mass production, reducing the size of data recording regions, and obtaining desired throughput. In particular, the laser patterning method is advantageous in that a patterning process used is simple and surfaces of obtained patterns are usually continuous, but is disadvantageous in that it is difficult to reduce the pattern size to less than 100 nm and to decrease the pitch of the pattern suitably for a high-density recording medium. In addition, three incident beams are required to obtain a circular pattern such that an apparatus used for the laser patterning method may be larger and complicated.
- The present invention provides a method of manufacturing a recording medium that allows the reduction of sizes and pitches of regions (hereinafter, patterns) where bit data is recorded in a magnetic film and is simple.
- According to an aspect of the present invention, there is provided a method of manufacturing a patterned recording medium, the method including: depositing a magnetic thin film on a substrate; aligning a hard mask that has a plurality of penetration holes regularly distributed therein above the magnetic thin film; irradiating the hard mask; and removing the hard mask.
- The diameters of the penetration holes may be less than 100 nm. The pitches of the penetration holes may be of a nanometer scale. The magnetic anisotropic energy of the magnetic thin film may be in the range of 5×104 to 5×108 erg/cc.
- Light irradiated onto the hard mask may be a laser beam having a wavelength greater than the diameters of the penetration holes.
- The laser beam may be emitted, using a CO2 laser, an Nd:YAG laser, a He—Ne laser, a N2 laser, a HF laser, or a DF laser.
- Lenses may be formed in at least one of outlets and inlets of the penetration holes.
- The hard mask may contact the magnetic thin film.
- The hard mask may be formed using anodic aluminum oxidization (AAO).
- The present invention can simultaneously form patterns on a magnetic thin film of a recording medium in a single process. Accordingly, since the process of forming patterns is simple, the production of the recording media can be increased. In addition, since the sizes and pitches of the patterns formed in the magnetic thin film are determined according to the sizes and pitches of holes formed on a hard mask, the sizes of the patterns can be reduced to less than 100 nm and the pitches of the patterns can be also decreased. In particular, since the patterns are simultaneously formed using the hard mask, the patterns can be regularly formed, thereby increasing the density of the patterns, and increasing the recording density of the recording medium.
- The above and other features and advantages of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings in which:
-
FIG. 1 is a cross-sectional view of a preliminary recording medium and a hard mask for a method of manufacturing a patterned recording medium according to an embodiment of the present invention; -
FIG. 2 is a plane view of the hard mask illustrated inFIG. 1 ; -
FIG. 3 is a cross-sectional view illustrating the incidence of laser beams on the recording medium ofFIG. 1 ; -
FIG. 4 is a plan view illustrating when directions of magnetic dipoles in patterns formed on a magnetic thin film of the recording medium ofFIG. 3 are parallel to the surface of the magnetic thin film; -
FIG. 5 is a cross-sectional view of a preliminary recording medium and a hard mask for a method of manufacturing a patterned recording medium according to another embodiment of the present invention; -
FIG. 6 is a plan view illustrating when directions of magnetic dipoles in patterns formed on the magnetic thin film of the recording medium ofFIG. 3 are normal to the surface of the magnetic thin film; -
FIG. 7 is a cross-sectional view of the recording medium sectioned along the line 7-7′ ofFIG. 6 ; -
FIGS. 8 through 10 are cross-sectional views of hard masks having lenses. - Hereinafter, the present invention will be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. The sizes and thicknesses of layers and regions are exaggerated for clarity.
- A method of manufacturing a patterned recording medium according to an embodiment of the present invention employs a laser patterning technology and a specific hard mask to manufacture a recording medium having desired patterns. The laser patterning technology is used for changing magnetic characteristics of a predetermined region of a magnetic thin film, for example, changing the region from a paramagnetic region to a ferromagnetic region. That is, a predetermined paramagnetic region is instantly heated up to a high temperature, for example, 500 to 2,000° C., using the laser, and becomes ferromagnetic. The ferromagnetic region on the magnetic thin film becomes a pattern where bit data is recorded.
- Referring to
FIG. 1 , in a method of manufacturing a patterned recording medium according to an embodiment of the present invention, a magneticthin film 32 is deposited on asubstrate 30 to form apreliminary recording medium 35. The magneticthin film 32 may be a paramagnetic thin film and have a magnetic anisotropic energy of 5×104 to 5×108 erg/cc. Then, ahard mask 36 is aligned above thepreliminary recording medium 35. Thehard mask 36 is formed of, for example, an aluminum oxide layer, and has a thickness of 5 to 100 nm. - The
hard mask 36 has a plurality of penetration holes h regularly distributed therein, as illustrated inFIG. 2 .FIG. 1 illustrates a cross-section of thehard mask 36 sectioned along the line 1-1′ inFIG. 2 . The penetration holes h can have various shapes and may be, for example, circular, elliptical or rectangular. The diameters D of the penetration holes h determine diameters of patterns formed on the magneticthin film 32 in the following process, and are small, for example, less than 100 nm. In addition, the pitches p of the penetration holes h determine the pitches of the patterns formed on the magneticthin film 32 and may be, for example, 25 nm. -
FIG. 3 is a cross-sectional view illustrating incidence of laser beams on the recording medium ofFIG. 1 . Referring toFIG. 3 , the entire top surface of the alignedhard mask 36 is simultaneously irradiated with a uniform intensity oflaser beams 40. One irradiation may be enough, but an additional irradiation can be performed if necessary. Thelaser beams 40 can be scanned across thehard mask 36, for example, from left to right. Then, thehard mask 36 is removed. - The
incident laser beams 40 can be produced by a laser emitting a long wavelength laser beam, for example, a CO2 laser, an Nd:YAG laser, a He—Ne laser, a N2 laser, a HF laser, or a DF laser. The intensity of thelaser beams 40 may be sufficient to instantly heat predetermined regions of the magneticthin film 32 where the laser beams pass through the penetration holes h and, accordingly, make the predetermined regions ferromagnetic. - If the wavelength of the
incident laser beams 40 is less than the diameters D of the penetration holes h, most of thelaser beams 40 are scattered andfew laser beams 40 penetrate the penetration holes h. Otherwise, if the wavelength of theincident laser beams 40 is greater than the diameters D of the penetration holes h, most of thelaser beams 40 can reach the magneticthin film 32 through the penetration holes h, as shown inFIG. 3 . Although not illustrated inFIG. 3 , some of thelaser beams 40 can be diffracted through the penetration holes h, causing problems such as a reduction in the sharpness of the patterns. However, adjusting the irradiation conditions of thelaser beams 40 and properly changing the distance between thehard mask 36 and the magneticthin film 32 can overcome such problems. That is, if thehard mask 36 contacts the magneticthin film 32 during the irradiation, as illustrated inFIG. 5 , the influence of the diffraction can be insignificant. Thus, the irradiation efficiency of theincident laser beams 40 is higher in the case that thehard mask 36 contacts the magneticthin film 32 than in the case that thehard mask 36 is separated from the magneticthin film 32. Therefore, the electric power used for theincident laser beams 40 can be reduced when thehard mask 36 contacts the magneticthin film 32. - As described above, the radiation of the
laser beams 40 on thehard mask 36 formsferromagnetic regions 34 having identical shapes, diameters, and pitches, and a uniform distribution on the magneticthin film 32, thus forming apatterned recording medium 100 having the patterns of theferromagnetic regions 34. A protective layer (not illustrated) can be formed on the magneticthin film 32 of the patternedrecording medium 100 in the following process. -
FIG. 4 is a plan view of the magneticthin film 32 having thepatterns 34 of the patternedrecording medium 100.FIG. 3 is a cross-section of thehard mask 36 and thepatterned recording medium 100 along the line 3-3′ inFIG. 4 . The patterns inFIG. 4 are exaggerated for clarity. Referring toFIG. 4 , thepatterns 34 are circular, and are regularly distributed on the magneticthin film 32. The diameters D1 of thepatterns 34 are less than 100 nm. In addition,FIG. 4 illustrates magnetic dipoles of thepatterns 34 formed on the magneticthin film 32 in the case of a parallel magnetic recording medium. Arrows in the circles indicate the direction of the magnetic dipoles of thepatterns 34 aligned in a certain direction by magnetization. If the directions of the arrows in the circles illustrated inFIG. 4 indicate the case of bit data ‘1’, arrows in the opposite direction would indicate bit data ‘1’. In the case of a vertical magnetic recording medium, magnetic dipoles of patterns formed on a magneticthin film 32 are normal to the surface of the magneticthin film 32, as shown inFIG. 6 , not parallel to the surface of the magneticthin film 32 as illustrated inFIG. 4 . -
Spots 37 in thepatterns 34 ofFIG. 6 indicatemagnetic dipoles 37 of thepatterns 34 directed upward and normal to the surface of the magneticthin film 32.FIG. 7 illustrates a cross-section of thepattern 34 sectioned along the line 7-7′ inFIG. 6 . The direction of the magnetic dipoles ofFIG. 6 are clearly shown inFIG. 7 . As illustrated inFIG. 7 , if themagnetic dipoles 37 of thepatterns 34 directed upward with respect to the surface of the magneticthin film 32 indicates the case of recording bit data ‘0’, when bit data ‘1’ are recorded to some of the patterns using a data recording/reproducing unit including a magnetic head or a probe, themagnetic dipoles 37 of the selectedpatterns 34 are directed downward. - As illustrated in
FIGS. 8 and 9 ,lenses 42 can be formed in thehard mask 36 used for forming thepatterns 34 on the magneticthin film 32. In particular, thelenses 42 can be formed at outlets or inlets of the penetration holes h formed in thehard mask 36. When thelenses 42 are formed in thehard mask 36, the magneticthin film 32 can be separated from thehard mask 36 according to focal lengths and depths of thelenses 42, and spot sizes of thelaser beams 40 can be reduced. Accordingly, thepatterns 34 formed on the magneticthin film 32 can have a higher resolution, thus enhancing the data recording density of therecording medium 100. In addition, as illustrated inFIG. 8 , when thelenses 42 are formed at the outlets the penetration holes h in thehard mask 36, theincident laser beams 40 are respectively converged by thelenses 42 immediately after penetrating the penetration holes h, thereby eliminating diffraction of the laser beams 40. Accordingly, the efficiency of using thelaser beams 40 is increased. - Otherwise, as illustrated in
FIG. 10 ,first lenses 42 a andsecond lenses 42 b may be formed at the outlets and inlets of the penetration holes h formed in thehard mask 36, respectively. Focal lengths of the first andsecond lenses - The magnetic
thin film 32 formed on therecording medium 100 may be substituted by other data writable materials, for example, a ferroelectric thin film. A material layer may be disposed between thesubstrate 30 and the magneticthin film 32 to assist in forming thepattern 34. - As described above, in the method of manufacturing a patterned recording medium, the
hard mask 36 is used to simultaneously form a plurality of patterns. Accordingly, the recording medium can be manufactured in a short time and in large quantities by using the method of the present invention. In addition, since the diameters D and the pitches p of the penetration holes h can be set as desired when manufacturing thehard mask 36, the penetration holes h can be formed with various shapes. The patterns in the patterned recording medium can be circular, the sizes of the patterns can be less than 100 nm, and the pitches of the patterns can be of a nano scale, for example, about 25 nm. Accordingly, the method of manufacturing a patterned recording medium according to the present invention can produce a reliable recording medium having a high data recording density. - While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims.
Claims (9)
1. A method of manufacturing a patterned recording medium, the method comprising:
depositing a magnetic thin film on a substrate;
aligning a hard mask that has a plurality of penetration holes regularly distributed therein above the magnetic thin film;
irradiating the hard mask; and
removing the hard mask.
2. The method of claim 1 , wherein the diameters of the penetration holes are less than 100 nm.
3. The method of claim 1 , wherein the pitches of the penetration holes are of a nanometer scale.
4. The method of claim 1 , wherein the magnetic anisotropic energy of the magnetic thin film is in the range of 5×104 to 5×108 erg/cc.
5. The method of claim 1 , wherein light irradiated onto the hard mask is a laser beam having a wavelength greater than the diameters of the penetration holes.
6. The method of claim 5 , wherein the laser beam is emitted using a CO2 laser, an Nd:YAG laser, a He—Ne laser, a N2 laser, a HF laser, or a DF laser.
7. The method of claim 1 , wherein lenses are formed in at least one of outlets and inlets of the penetration holes.
8. The method of claim 1 , wherein the hard mask contacts the magnetic thin film.
9. The method of claim 1 , wherein the hard mask is formed using anodic aluminum oxidization (AAO).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR1020050018129A KR100624462B1 (en) | 2005-03-04 | 2005-03-04 | Method of manufacturing patterned media for recoding |
KR10-2005-0018129 | 2005-03-04 |
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US20060198950A1 true US20060198950A1 (en) | 2006-09-07 |
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US11/367,452 Abandoned US20060198950A1 (en) | 2005-03-04 | 2006-03-06 | Method of manufacturing patterned recording medium |
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US (1) | US20060198950A1 (en) |
JP (1) | JP2006244694A (en) |
KR (1) | KR100624462B1 (en) |
CN (1) | CN100382151C (en) |
Cited By (1)
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US20060196945A1 (en) * | 2002-10-30 | 2006-09-07 | Mendels David A | Identification device, anti-counterfeiting apparatus and method |
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JP4938019B2 (en) * | 2006-09-28 | 2012-05-23 | パイオニア株式会社 | Oxide material, patterning substrate, pattern formation method, imprint transfer mold manufacturing method, recording medium manufacturing method, imprint transfer mold and recording medium |
Citations (11)
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2005
- 2005-03-04 KR KR1020050018129A patent/KR100624462B1/en active IP Right Grant
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- 2006-03-06 JP JP2006060321A patent/JP2006244694A/en active Pending
- 2006-03-06 US US11/367,452 patent/US20060198950A1/en not_active Abandoned
- 2006-03-06 CN CNB2006100581414A patent/CN100382151C/en not_active Expired - Fee Related
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US4451500A (en) * | 1981-09-21 | 1984-05-29 | Commissariat A L'energie Atomique | Process for obtaining a homogeneous planar magnetization layer in a ferrimagnetic garnet |
US20100112311A1 (en) * | 1997-08-08 | 2010-05-06 | Hironori Kobayashi | Structure for pattern formation, method for pattern formation, and application thereof |
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US20050130045A1 (en) * | 2003-01-28 | 2005-06-16 | Ken Ozawa | Exposing mask and production method therefor and exposing method |
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Also Published As
Publication number | Publication date |
---|---|
CN100382151C (en) | 2008-04-16 |
KR100624462B1 (en) | 2006-09-19 |
CN1828732A (en) | 2006-09-06 |
JP2006244694A (en) | 2006-09-14 |
KR20060096864A (en) | 2006-09-13 |
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